Chemical vapour deposition or CVD is a generic name for a group of processes that involve depositing a solid material from a gaseous phase and is similar in some respects to physical vapour deposition ...
Chemical vapor deposition (CVD) is a process of deposition of a solid material, such as nanotubes, nanowires, particle, thin film, and much more, on a substrate by creating reactive species in the ...
Chemical Vapor Deposition (CVD) is a widely used technique in materials science, particularly in the fabrication of thin films and coatings, as well as the synthesis of advanced materials. It involves ...
Chemical vapor deposition (CVD) is a process wherein a solid material, such as nanotubes, nanowires, particle, thin film, and much more, is deposited onto a substrate by forming reactive species in ...
Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) are two processes used to produce a very thin layer of material, known as a thin film, onto a substrate. Vapor deposition techniques ...
SCHWALBACH, Germany — Samsung Electronics Co. Ltd. has developed a chemical vapor deposition (CVD) method for depositing aluminum interconnect in DRAMs using a 70-nm manufacturing process, the company ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results