Sputtering is a well-known physical vapor deposition (PVD) method finding use in several product applications. While commercial sputter systems are designed for large scale production volume of proven ...

Suitable cleaning and handling procedures must be used before placing substrates into the vacuum chamber. Moreover, it is common to incorporate in situ cleaning features like sputter etch into the ...

The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a ...

Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...